Open KIAS School on Quantum Information Science 2014
Beyond the Rayleigh limit in optical lithography (Lec. 1)
SPEAKER | Suhail Zubairy
INSTITUTE | Texas A&M
DATE | July 7(Mon), 2014
TIME | 13:30
PLACE | 고등과학원 국제회의실 (1호관 1층)
ABSTRACT | In optical lithography, the feature size in which scientists can write the circuits is limited to half
the wavelength of the light by something called the diffraction limit. Many attempts have been
made to advance this field beyond the current limit set by the wavelength of the laser used.
These methods are usually based on multi-photon processes, multiple beams and/or quantum
entanglement making the implementation of these schemes extremely difficult. In this talk, I shall
discuss these methods and then present a method for optical sub-wavelength lithography that is
only a single preparation step away from the currently implemented lithographic process.
During this crucial step, the electrons in the energy levels undergo oscillations called Rabi
oscillations between the ground and auxiliary levels. Nonlinear nature of Rabi oscillations allows
for sub-wavelength control of atomic excitation. This method can allow, in principle, to write a
pattern with an accuracy better than a millionth of the wavelebngth of the light used.